Atmospheric Pressure Plasma Equipment / Low Pressure Plasma Equipment for Semiconductor Cleaning
Plasma cleaning equipment that contributes to the improvement of quality in semiconductor manufacturing.
In the semiconductor industry, the removal of fine foreign substances and organic materials in the manufacturing process is a critical issue that affects product quality and yield. In particular, the cleaning of wafers and substrates is essential for maximizing device performance. Plasma cleaning offers high cleaning power and compatibility with materials to address these challenges. Our low-pressure and atmospheric plasma equipment contributes to the optimization of cleaning processes in semiconductor manufacturing. 【Application Scenarios】 - Cleaning of wafers and substrates - Removal of organic materials and foreign substances - Improved adhesion through surface modification 【Effects of Implementation】 - Enhanced cleaning quality - Improved yield - Increased product reliability
- Company：テクノアルファ
- Price：Other
